Photo Resist Oven Process

The photoresist process is used to create a usable silicon wafer product that will be used in products such as computers, sensors, cell phones, and tablets. During this process, a light-sensitive film known as photoresist is applied to the silicon wafer. The layers of photoresist materials provide a precise pattern formation on the wafer and protection of the substrate from possible chemicals that can attack during the etch process. 


The photoresist application process has several steps. Ovens and furnaces are used during the dehydration, soft baking, and development steps of the photoresist process. Blue M manufactures ovens that are used to dry or bake the photoresist layers on silicon wafers during this process.

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Many Blue M products can be used for our processes. Check out our full line of products to find the right one for your process needs.

   

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